JSPS International Symposium (2002) on
"Thermal Plasma Deposition"


28 January 2002, Sanjo Hall (Room201/202), The University of Tokyo, Japan
(Chairman: Prof. Toyonobu Yoshida)

(Sponsored by the Japan Society for the Promotion of Science
under the program
"Research for the Future" (97R15301))

The purpose of the symposium is to discuss recent progress in the fields of thermal plasma deposition, especially thermal plasma CVD, spraying, and cluster deposition. It is hoped that this symposium will both stimulate researchers in Japan and encourage international cooperation in this field.

9:30-9:35 Opening Address (Prof. Y.Horiike)
<A> Chemical Vapor Deposition
9:35-10:15 Prof. J. Heberlein (The University of Minnesota, USA)
"Supersonic Plasma Jet Deposition of Boron Carbide/Boron Nitride Composite Films"
10:15-10:55 Prof. K.Terashima (The University of Tokyo, Japan)
"Preparation of Epitaxial Oxide Films by Radio-Frequency Thermal Plasma"
10:55-11:05 Break
11:05-11:45 Prof. S.Girshick (The university of Minnesota, USA)
"Plasma Synthesis and Deposition of Nanoparticles"
11:45-12:25 Prof. Y.Ikuhara (The University of Tokyo, Japan)
"HREM and AEM Study of Thermal Plasma Deposited Fims)"
12:25-13:30 Lunch
<B> Spray Deposition
13:30-14:10 "Prof. W.Pan (Institute of Mechanics, China)
"Vacuum plasma spray for high quality TBC"
14:10-14:50 Prof. J.Mostaghimi (The University of Tronto, Canada)
"Towards a Complete Model of Thermal Spray Coating Process"
14:50-15:30 Prof. M.Boulos (The University of Sherbrooke, Canada)
"Plasma Synthesis and Deposition of Nanopowders "
15:30-15:45 Break
<C> Si Cluster and its Deposition
15:45-16:25 Prof. R.van de Sanden (Eindhoven University of techonology,Netherland)
"Fast Plasma Deposition of Thin Amorphous Films:In SITU Studies of The Growth Mechanism"
16:25-16:55 Prof. K.Kimura (The University of Tokyo, Japan)
"Trial of Cluster Production and Deposition Using a Quadrupole Ion Trap"
16:55-17:35 Prof. T.Yoshida (The University of Tokyo, Japan)
"Ultrafast Deposition of Microcrystalline Si Films by Thermal Plasma Chemical Vapor Deposition "
18:00-19:30 Banquet (Restaurant Matsumotorou)


Chairman of the Symposium
Professor Toyonobu Yoshida
 Department of Materials Engineering,Graduate School of Engineering,The University of Tokyo
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, JAPAN
Phone: +81-3-5841-7100 Fax: +81-3-5841-8641
E-mail: yoshida@plasma.t.u-tokyo.ac.jp

Conference secretaries;Chisako Takeo
Department of Advanced Materials Science, Faculty of Frontier Science, The University of Tokyo
7-3-1, Hongo, Bunkyo-ku, Tokyo, 113-8656 JAPAN
Tel: xx81-3-5841-7101 Fax: xx81-3-5841-7103
E-mail: takeo@terra.mm.t.u-tokyo.ac.jp


–ß‚é